Photocatalysis self-cleaning response of nano-WO3 modified polysulfone membrane
Paper ID : 1407-MST2015-FULL
Nader Shafaei *1, Majid Peyravi2, Mohsen Jahanshahi3, Ghasem Najafpour4
1Shariati Av., Babol, Mazandaran, 4714871167, Iran
2Membrane Research Group, Nanotechnology Institute, Babol University of Technology, Babol, Iran
3Head of Nanotechnology Research Institute Babol University of Technology Babol, P.O.BOX: 484, Iran
4Babol University of Technology, Babol, Iran
A photocatalysis self-cleaning polysulfone (PSf) ultrafiltration membranes were manipulated by adding different amounts of WO3 nanoparticles (0-2 wt. %) via phase inversion method. To evaluate the role of UV light on self-cleaning property, all synthesized membranes were tested with and without UV. Results show that WO3 addition affects the pore size, porosity and hydrophilicity of the WO3/PSf membrane; as, the porosity for 2wt. % WO3 achieved to 84.86%. The flux of the membrane with WO3 nanoparticles after being radiated by UV light was increased in comparison to the same membrane without UV light. The UV light did not have any effect on flux of the neat PSf membrane. The flux of the membrane with 2 wt. % WO3 was also better than the other modified and neat membranes. The Flux Recovery was also increased by increment the WO3 nanoparticles in the membrane and the amount was reached to 69.9 % for 2 wt. % WO3 under UV illumination. This fact indicates that the self-cleaning property have been created by WO3 nanoparticles on the surface of membrane in the presence of UV light.
Self-cleaning property- Leachate treatment- WO3 nanoparticle- Polysulfone membrane- Ultrafiltration- UV light
Status : Paper Accepted (Poster Presentation)